Experimental studies of H2/Ar plasma in a planar inductive discharge

被引：26

作者：

Gudmundsson, JT ^{[1
]}

机构：

[1] Univ Calif Berkeley, Dept Elect Engn & Comp Sci, Berkeley, CA 94720 USA

[2] Univ Iceland, Inst Sci, IS-107 Reykjavik, Iceland

来源：

PLASMA SOURCES SCIENCE & TECHNOLOGY | 1998年 / 7卷 / 03期

关键词：

D O I：

10.1088/0963-0252/7/3/011

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

A Langmuir probe was used to determine the electron density, electron temperature, plasma potential and the electron energy probability function (EEPF) in H-2/Ar plasma in a planar inductive discharge. We find that the electron density increases with increased fractional Ar pressure. The relative ion densities were measured by mass spectrometry. The dominant ions in Hp plasma in the pressure range investigated (10-40 mTorr) are found to be H-2(+) and H-3(+) of roughly equal densities.

引用

页码：330 / 336

页数：7

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