共 14 条
- [1] ELECTRON-CYCLOTRON RESONANCE MICROWAVE DISCHARGES FOR ETCHING AND THIN-FILM DEPOSITION [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1989, 7 (03): : 883 - 893
- [2] LARGE VOLUME, HIGH-DENSITY RF INDUCTIVELY COUPLED PLASMA [J]. APPLIED PHYSICS LETTERS, 1987, 50 (17) : 1130 - 1132
- [3] Chen F F., 1965, ELECT PROBES
- [4] Cherrington B., 1982, PLASMA CHEM PLASMA P, V2, P113, DOI [10.1007/BF00633129, DOI 10.1007/BF00633129]
- [5] APPLICATION OF A LOW-PRESSURE RADIO-FREQUENCY DISCHARGE SOURCE TO POLYSILICON GATE ETCHING [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1990, 8 (01): : 1 - 4
- [8] GODYAK VA, 1988, SEP NAT ADV STUD I P
- [9] HOLBER WM, 1989, HDB ION BEAM PROCESS
- [10] KELLER JH, IN PRESS J VAC SCI A