Comparison of resistance to protein adsorption and stability of thin films derived from α-hepta-(ethylene glycol) methyl ω-undecenyl ether on H-Si(111) and H-Si(100) surfaces

被引:27
作者
Yam, CM
Gu, JH
Li, S
Cai, CZ [1 ]
机构
[1] Univ Houston, Dept Chem, Houston, TX 77204 USA
[2] Univ Houston, Ctr Mat Chem, Houston, TX 77204 USA
基金
美国国家科学基金会;
关键词
oligo(ethylene glycol)-terminated thin films; hydrogen-terminated silicon surfaces; photo-induced surface hydrosilylation; protein adsorption; AFM anodization lithography; stability;
D O I
10.1016/j.jcis.2004.12.007
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Oligo(ethylene glycol)-terminated thin films were prepared by photo-induced hydrosilylation of alpha-hepta-(ethylene glycol) methyl omega-undecenyl ether (EG(7)) on hydrogen-terminated silicon(111) and (100) surfaces. Their resistance to protein adsorption. and stabilities (from hours to days) under a wide variety of conditions, such as air, water, biological buffer, acid. and base, were investigated using contact-angle goniometry and ellipsometry techniques. Results indicated higher stability of the films chemisorbed on Si(111) than on Si(100). Furthermore. micron-sized patterns were fabricated on the films via AFM anodization lithography. Using atomic force microscopy (AFM) and fluorescence microscopy. we demonstrated that various proteins including fibrinogen, avidin, and bovine serum albumin (BSA) predominately adsorbed onto the patterns. but not the rest of the film surfaces. (c) 2004 Elsevier Inc. All rights reserved.
引用
收藏
页码:711 / 718
页数:8
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