Hexadecafluoro-copper-phthalocyanine UHV deposited onto Si(111)7x7 substrate: an XPS study

被引：23

作者：

Ottaviano, L

Lozzi, L

Rispoli, F

Santucci, S

机构：

[1] Univ Aquila, INFM, I-67010 Coppito, Laquila, Italy

[2] Univ Aquila, Dept Phys, I-67010 Coppito, Laquila, Italy

来源：

SURFACE SCIENCE | 1998年 / 402卷 / 1-3期

关键词：

evaporation and sublimation; low index single crystal surfaces; photoelectron spectroscopy; phthalocyanine; silicon; single crystal surfaces; surface chemical reaction; X-ray photoelectron spectroscopy;

D O I：

10.1016/S0039-6028(97)00960-6

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

We have deposited, in ultra-high vacuum conditions, hexadecafluoro copper phthalocyanine on to clean Si(111) 7 x 7 substrate and studied the organic-inorganic interface by means of monochromatic X-ray photoemission spectroscopy. The measurements, performed at various organic film thicknesses, show a strong interaction between the molecule and the silicon substrate. The presence of the 16 fluorine atoms at the outer structure of the planar molecule allows an easy detection of the chemisorption effects on the substrate. The results suggest the growth of a planar ultra-thin film of molecules on to the silicon surface. (C) 1998 Elsevier Science B.V. All rights reserved.

引用

页码：518 / 522

页数：5

共 10 条

[1] ELECTRON-SPECTROSCOPY STUDY OF SILICON SURFACES EXPOSED TO XEF2 AND THE CHEMISORPTION OF SIF4 ON SILICON [J].