Atomistic simulation of dislocation emission in nanosized grain boundaries

被引:80
作者
Derlet, PM [1 ]
Van Swygenhoven, H [1 ]
Hasnaoui, A [1 ]
机构
[1] Paul Scherrer Inst, CH-5232 Villigen, Switzerland
关键词
D O I
10.1080/14786430310001599397
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The present work deals with the atomic mechanism responsible for the emission of partial dislocations from grain boundaries (GB) in nanocrystalline metals. It is shown that, in a 12 nm grain-size sample, GBs containing grain-boundary dislocations (GBDs) can emit a partial dislocation during deformation by local atomic shuffling and stress-assisted free-volume migration. As in previous work, the nucleation occurs at a GBD, which, upon nucleation and propagation, is removed. In the present case, free-volume migration occurs away from the nucleation region both before and after the nucleation event.
引用
收藏
页码:3569 / 3575
页数:7
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