Epitaxy of Fe/Cu/Si(111) ultrathin films: an Auger electron diffraction study

被引：8

作者：

Castrucci, P ^{[1
]}

Gunnella, R ^{[1
]}

Bernardini, R ^{[1
]}

Montecchiari, A ^{[1
]}

Carboni, R ^{[1
]}

De Crescenzi, M ^{[1
]}

机构：

[1] Univ Camerino, Dipartimento Matemat & Fis, Unita INFM, I-62032 Camerino, Italy

来源：

SURFACE SCIENCE | 2001年 / 482卷

关键词：

low energy electron diffraction (LEED); Auger electron diffraction; growth; epitaxy; magnetic films;

D O I：

10.1016/S0039-6028(01)00816-0

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Epitaxial Fe films, with thickness in the range between 1 and 50 ML (monolayer, ML), were grown in ultrahigh vacuum conditions on the 7 x 7 reconstructed (111)-Si surface. The films were evaporated on a Cu thick buffer layer to avoid iron silicides formation. Auger electron diffraction (AED) technique has been used to investigate the growth of the pseudomorphic film of fcc gamma -Fe(111) and the successive growth of bee Fe(110) domains in the Kurdjumov-Sachs orientation. The early stages of growth have been carefully investigated through AED to assess the pseudomorphism of iron gamma -phase. AED patterns clearly show the presence of diffraction features that are fingerprints of the existence of a few bcc arranged atomic structures even for 1 ML iron coverage. (C) 2001 Elsevier Science B.V. All rights reserved.

引用

页码：916 / 921

页数：6

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