Nanoscale gap fabrication by carbon nanotube-extracted lithography (CEL)

被引：21

作者：

Chung, JH ^{[1
]}

Lee, KH ^{[1
]}

Lee, JH ^{[1
]}

机构：

[1] Northwestern Univ, Mech Engn Dept, Evanston, IL 60208 USA

来源：

NANO LETTERS | 2003年 / 3卷 / 08期

关键词：

D O I：

10.1021/nl0342500

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Carbon nanotube (CNT) -extracted lithography (CEL) was developed to create high-quality nanoscale gaps defined by the size of CNTs. An individual multiwalled CNT (MWCNT) was deposited across electrodes by the composite electric field guided assembly method (CEGA) developed previously. After blanket deposition of a metal layer, the MWCNT was removed to obtain a nanoscale gap. The CEL can provide a technique for the mass fabrication of well-defined and precisely positioned nanosized gaps in a reproducible manner.

引用

页码：1029 / 1031

页数：3

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