A new preparation method for sputtered MoO3 multilayers for the application in gas sensors

被引:79
作者
Imawan, C [1 ]
Steffes, H [1 ]
Solzbacher, F [1 ]
Obermeier, E [1 ]
机构
[1] Tech Univ Berlin, MAT, Sekr TIB 3 1, D-13355 Berlin, Germany
关键词
sputtering; MoO3; multilayer; H-2 gas sensors;
D O I
10.1016/S0925-4005(01)00801-2
中图分类号
O65 [分析化学];
学科分类号
070302 ; 081704 ;
摘要
A new method for the preparation of sputtered MoO3 multilayer thin films for the application in gas sensors has been developed. A remarkable change of the crystallinity and the microstructure compared to the whisker-like structure of conventionally sputtered MoO3 single-layer films is found. The multilayer films have a dense and a smooth structure with a small crystallite size. This preparation method evidences that the H-2 sensing properties, such as sensitivity, selectivity, response time and long-term stability of the sensors can be improved. The cross-sensitivity towards NO2, NH3, CO, CH4, and SO2 is low. The response time (tau (50)) to H-2 can be drastically reduced from 40 s for the single-layer film to 10 s. The sensor exposes a very high response to H2 with a good signal linearity for high concentrations ranging from 2000 to 9000 ppm. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:119 / 125
页数:7
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