Characteristics of indium zinc oxide top cathode layers grown by box cathode sputtering for top-emitting organic light-emitting diodes

被引:24
作者
Kim, HK
Lee, KS
Kang, HA
机构
[1] Kumoh Natl Inst Technol, Sch Mat & Syst Engn, Gumi 730701, Gyeongbuk, South Korea
[2] Samsung SDI Co Ltd, Core Technol Lab, Suwon 442391, South Korea
关键词
D O I
10.1149/1.2139953
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
Electrical, optical, and structural properties of indium zinc oxide (IZO) films grown by a box cathode sputtering (BCS) were investigated as a function of oxygen flow ratio. A sheet resistance of 42.6 Omega/square, average transmittance above 88% in visible range, and root-mean-square roughness of 2.7 angstrom were obtained even in the IZO layers grown at room temperature. The top-emitting organic light-emitting diodes (TOLEDs) with the IZO top cathode layer were prepared and their electrical properties compared with TOLEDs with Mg-Ag/indium tin oxide (ITO) cathode layer and TOLEDs with only thermally evaporated Mg-Ag cathode layer. In addition, the effects of oxygen flow ratio in IZO films are investigated, based on X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), ultraviolet/visible (UV/VIS) spectrometer, scanning electron microscopy (SEM), and atomic force microscopy (AFM) analysis results. (c) 2005 The Electrochemical Society.
引用
收藏
页码:H29 / H33
页数:5
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