Effect of Xe+ bombardment on the formation of highly oriented rutile-type titanium oxide films

Titanium oxide films were prepared by ion beam enhanced deposition (IBED), where the films were synthesized by depositing titanium atoms by electron beam evaporation and simultaneous bombardment with xenon ions (40 keV). The result shows that the films exhibit a highly oriented (100) rutile-type phase structure. The structure of the films prepared by electron beam evaporation on a titanium oxide thin layer (500 Angstrom) which has been deposited during ion bombardment was also studied. The degree of orientation of these films was more developed than films grown with ion-assisted bombardment only if the substrate temperature was more than 150 degrees C. The effect of the xenon ion beam bombardment is discussed. (C) 1998 Elsevier Science S.A.