Rapid direct micromachining of PTFE using MeV ions in an oxygen rich atmosphere

被引:9
作者
Grime, GW [1 ]
Sofield, CJ
Gomez-Morilla, I
Gwilliam, R
Ynsa, MD
Enguita, O
机构
[1] Univ Surrey, Dept Phys, Guildford GU2 7XH, Surrey, England
[2] Univ Surrey, Adv Technol Inst, Guildford GU2 7XH, Surrey, England
[3] Ctr Nacl Acceleradores, Seville 41092, Spain
[4] Univ Autonoma Madrid, Ctr Microanal Mat, E-28049 Madrid, Spain
基金
英国工程与自然科学研究理事会;
关键词
fluoropolymers; ion beam lithography; radiation damage; micromachining;
D O I
10.1016/j.nimb.2005.01.086
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
We have investigated the mechanism of high rate erosion which is observed when polytetrafluoroethylene (PTFE) is exposed to MeV protons in an oxygen rich atmosphere (e.g. air). Using currents of the order of nA, it is possible to create holes with depths of millimetres and diameter defined by the beam area on the surface with exposure times of minutes. This is not observed in atmospheres of nitrogen, helium or argon nor in vacuum. We propose that the erosion is a result of the formation of a stable gaseous compound following beam induced decomposition of the PTFE (possibly an acyl fluoride) which does not re-deposit in the hole. We present the results of experiments leading to this hypothesis and propose a method for fabricating three-dimensional structures in PTFE with micrometre feature size. This process is the subject of an international patent application. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:378 / 383
页数:6
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