Photoluminescence and photoconductivity of Si- and Ge-rich SiGe bulk crystals

被引:9
作者
Franz, M
Pressel, K
Barz, A
Dold, P
Benz, KW
机构
[1] Inst Semicond Phys, D-15230 Frankfurt, Germany
[2] Univ Freiburg, Inst Kristallog, D-79104 Freiburg, Germany
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1998年 / 16卷 / 03期
关键词
D O I
10.1116/1.590041
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We have investigated Si- (0 less than or equal to x less than or equal to 0.13) and Ge-rich (0.90 less than or equal to x less than or equal to 1) Si1-xGex bulk crystals by photoluminescence and photoconductivity measurements. The small linewidths of the near band edge luminescence of less than 4 meV demonstrate the high quality of the crystals. Luminescence linewidth, line shape, and intensity ratios of transitions with and without phonon participation reveal a stronger influence of alloy effects on excitons on the Ge-rich side compared with the Si-rich side. Photoconductivity spectra of boron doped Si-rich and phosphorus doped Ge-rich Si1-xGex crystals show the influence of alloy composition and alloy fluctuations on the impurity levels. The shift of the photoconductivity spectra with increasing Si or Ge concentration indicates the change of the ground state energy of the impurity with changing alloy composition. (C) 1998 American Vacuum Society.
引用
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页码:1717 / 1720
页数:4
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