Local surface modification of aluminum by laser irradiation

被引:22
作者
Kikuchi, T [1 ]
Chu, SZ [1 ]
Jonishi, S [1 ]
Sakairi, M [1 ]
Takahashi, H [1 ]
机构
[1] Hokkaido Univ, Grad Sch Engn, Interface MicroStruct Anal Lab, Kita Ku, Sapporo, Hokkaido 0608628, Japan
关键词
anodic oxide film; aluminum; laser irradiation; pulsed YAG laser; local surface modification;
D O I
10.1016/S0013-4686(01)00552-7
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
A novel method involving a combination of pulsed YAG laser irradiation and electrochemistry for chemical and physical modification of aluminum surface at a selected area is reviewed. Local metal deposition is carried out by successive steps of anodizing, laser irradiation, and electroplating (or electroless plating), and the fabrication of a prototype for printed circuit boards is attempted. Local organic film deposition with anodizing, laser irradiation, and electrophoretic deposition is introduced, and the formation of microtrenches and pores on aluminum surfaces with anodizing, laser irradiation, and electrochemical etching (or chemical etching) is also described. It is emphasized that the key technology in these procedures is to use aluminum as a target for the laser irradiation in solution, and that anodic oxide films on aluminum play an important role in the processes. (C) 2001 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:225 / 234
页数:10
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