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LASER-INDUCED COPPER PLATING
被引:19
作者
:
ALSUFI, AK
论文数:
0
引用数:
0
h-index:
0
机构:
SCHERING AG, D-1000 BERLIN 65, FED REP GER
SCHERING AG, D-1000 BERLIN 65, FED REP GER
ALSUFI, AK
[
1
]
EICHLER, HJ
论文数:
0
引用数:
0
h-index:
0
机构:
SCHERING AG, D-1000 BERLIN 65, FED REP GER
SCHERING AG, D-1000 BERLIN 65, FED REP GER
EICHLER, HJ
[
1
]
SALK, J
论文数:
0
引用数:
0
h-index:
0
机构:
SCHERING AG, D-1000 BERLIN 65, FED REP GER
SCHERING AG, D-1000 BERLIN 65, FED REP GER
SALK, J
[
1
]
RIEDEL, HJ
论文数:
0
引用数:
0
h-index:
0
机构:
SCHERING AG, D-1000 BERLIN 65, FED REP GER
SCHERING AG, D-1000 BERLIN 65, FED REP GER
RIEDEL, HJ
[
1
]
机构
:
[1]
SCHERING AG, D-1000 BERLIN 65, FED REP GER
来源
:
JOURNAL OF APPLIED PHYSICS
|
1983年
/ 54卷
/ 06期
关键词
:
D O I
:
10.1063/1.332404
中图分类号
:
O59 [应用物理学];
学科分类号
:
摘要
:
引用
收藏
页码:3629 / 3631
页数:3
相关论文
共 3 条
[1]
INVESTIGATION OF LASER-ENHANCED ELECTROPLATING MECHANISMS
[J].
PUIPPE, JC
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
PUIPPE, JC
;
ACOSTA, RE
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
ACOSTA, RE
;
VONGUTFELD, RJ
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
VONGUTFELD, RJ
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1981,
128
(12)
:2539
-2545
[2]
VONGUTFELD RJ, 1979, APPL PHYS LETT, V34, P617, DOI 10.1063/1.90637
[3]
LASER-ENHANCED PLATING AND ETCHING - MECHANISMS AND APPLICATIONS
[J].
VONGUTFELD, RJ
论文数:
0
引用数:
0
h-index:
0
VONGUTFELD, RJ
;
ACOSTA, RE
论文数:
0
引用数:
0
h-index:
0
ACOSTA, RE
;
ROMANKIW, LT
论文数:
0
引用数:
0
h-index:
0
ROMANKIW, LT
.
IBM JOURNAL OF RESEARCH AND DEVELOPMENT,
1982,
26
(02)
:136
-144
←
1
→
共 3 条
[1]
INVESTIGATION OF LASER-ENHANCED ELECTROPLATING MECHANISMS
[J].
PUIPPE, JC
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
PUIPPE, JC
;
ACOSTA, RE
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
ACOSTA, RE
;
VONGUTFELD, RJ
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
VONGUTFELD, RJ
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1981,
128
(12)
:2539
-2545
[2]
VONGUTFELD RJ, 1979, APPL PHYS LETT, V34, P617, DOI 10.1063/1.90637
[3]
LASER-ENHANCED PLATING AND ETCHING - MECHANISMS AND APPLICATIONS
[J].
VONGUTFELD, RJ
论文数:
0
引用数:
0
h-index:
0
VONGUTFELD, RJ
;
ACOSTA, RE
论文数:
0
引用数:
0
h-index:
0
ACOSTA, RE
;
ROMANKIW, LT
论文数:
0
引用数:
0
h-index:
0
ROMANKIW, LT
.
IBM JOURNAL OF RESEARCH AND DEVELOPMENT,
1982,
26
(02)
:136
-144
←
1
→