Laser conditioning of LaF3/MgF2 dielectric coatings at 248 nm

被引:57
作者
Eva, E
Mann, K
Kaiser, N
Anton, B
Henking, R
Ristau, D
Weissbrodt, P
Mademann, D
Raupach, L
Hacker, E
机构
[1] FRAUNHOFER INST,ANGEW OPTIK & FEINMECH JENA,D-07745 JENA,GERMANY
[2] LASER ZENTRUM HANNOVER EV,D-30419 HANNOVER,GERMANY
[3] OPTIK SYST GMBH,JENOPTIK LASER,D-07739 JENA,GERMANY
来源
APPLIED OPTICS | 1996年 / 35卷 / 28期
关键词
conditioning; fluoride coatings; excimer lasers; laser damage; absorption;
D O I
10.1364/AO.35.005613
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Highly reflective LaF3/MgF2 systems for a wavelength of 248 nm on MgF2 and crystalline quartz substrates were investigated. The influence of laser conditioning on damage threshold and absorptance was remarkable in those coatings that had a high initial absorptance. Monitoring with a laser calorimeter revealed the conditioning effect to be a function of the irradiation dose rather than of energy density or pulse rate. Furthermore, x-ray photoelectron spectroscopy and transmission electron microscopy showed that conditioning induces stoichiometric and structural changes in the multilayers, especially in near-surface sublayers, whereas scanning electron microscopy and atomic force microscopy investigations indicated that the surface remains unchanged. (C) 1996 Optical Society of America
引用
收藏
页码:5613 / 5619
页数:7
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