Preparation of titanium oxide layer on silica glass substrate with titanium naphthenate precursor

Nanocrystalline TiO2 thin films on silica glass substrates were prepared by using a naphthenic acid precursor. As-deposited thin films were heat treated at 500, 600, 700 and 800 degrees C for 30 min in air. The TiO2 thin films were analyzed by High Resolution X-ray diffraction, ultra violet-visible-near infrared spectrophotometer, field emission-scanning electron microscope and scanning probe microscope. After annealing at 600 and 700 degrees C, the XRD patterns consist of only anatase peaks of TiO2 film. Rutile(110) peak begins to appear at an annealing temperature of 800 degrees C. Relative high transmittance at visible rangewas obtained for all films except the film annealed at 800 degrees C. Optical band gap, E-g, is in the range between 3.53 and 3.78 eV except the TiO2 film annealed at 500 degrees C. The best hydrophilicity was achieved with a high-temperature annealing.