Simulation calculations of mutual contamination between tungsten and carbon and its impact on plasma surface interactions

被引:16
作者
Ohya, K [1 ]
Kawakami, R
Tanabe, T
Wada, M
Ohgo, T
Philipps, V
Pospieszczyk, A
Huber, A
Rubel, M
Sergienko, G
Noda, N
机构
[1] Univ Tokushima, Fac Engn, Tokushima 7708506, Japan
[2] Natl Inst Fus Sci, Gifu 5095292, Japan
[3] Russian Acad Sci, Inst High Temp, Moscow 127412, Russia
[4] Royal Inst Technol, Alfven Lab, S-10044 Stockholm, Sweden
[5] Forschungszentrum Julich, EURATOM Assoc, Inst Plasmaphys, D-52425 Julich, Germany
[6] Fukuoka Univ Educ, Dept Phys, Fukuoka 8114192, Japan
[7] Doshisha Univ, Dept Elect, Kyoto 6100394, Japan
[8] Nagoya Univ, Ctr Integrated Res Sci & Engn, Nagoya, Aichi 4648603, Japan
关键词
plasma-material interaction; tungsten; carbon; erosion; deposition; modelling;
D O I
10.1016/S0022-3115(00)00632-2
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Mutual contamination between C and W, resulting from the simultaneous use of these materials as plasma facing components, is simulated by means of a computer simulation code, Erosion and Deposition based on Dynamic model (EDDY). W deposition on C rapidly increases the reflection coefficient for D and C impurity. In comparison between the calculation and a C-W twin test limiter experiment in TEXTOR-94, C release from the C side of the limiter is dominated by reflection of C impurity from the W deposits, in addition to physical sputtering of C; chemical erosion is strongly suppressed. Due to the dynamic effect which makes C-W mixed layer, C deposition on W gradually changes the reflection coefficient and sputter yields. Formation of a sharp boundary between erosion and C deposition zones on the W side of the limiter is well reproduced by simulation. Local redeposition patterns of C and W on the limiter surface are also calculated. (C) 2001 Elsevier Science B.V, All rights reserved.
引用
收藏
页码:303 / 307
页数:5
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