Study of iron nitride thin films deposited by pulsed laser deposition

被引:53
作者
Gupta, M
Gupta, A
Bhattacharya, P
Misra, P
Kukreja, LM
机构
[1] Interuniv Consortium, DAE Facil, Indore 452017, Madhya Pradesh, India
[2] Ctr Adv Technol, Thin Film Lab, Indore 452013, India
关键词
iron nitrides; pulsed laser deposition; thin films; Mossbauer spectroscopy; X-ray diffraction;
D O I
10.1016/S0925-8388(01)01316-0
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Thin films of iron nitrides were deposited by pulsed laser deposition at different nitrogen pressures. Depositions were done both in the presence as well as absence of glow-discharge around the substrate. Films deposited without glow-discharge were essentially ferromagnetic in nature and exhibited a structural evolution from b.c.c.-->b.c.t.-->f.c.c.-->h.c.p.--> orthorhombic phases as the nitrogen pressure during the deposition increased. As a result of glow-discharge during the deposition process, increased nitridation is obtained and formation of new-cubic-type Fe-N phases occur. (C) 2001 Elsevier Science BV All rights reserved.
引用
收藏
页码:265 / 269
页数:5
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