Influence of deposition temperature (Ts), air flow rate (f) and precursors on cathodoluminescence properties of ZnO thin films prepared by spray pyrolysis

被引:55
作者
El Hichou, A
Addou, M
Ebothé, J
Troyon, M
机构
[1] Univ Reims, UFR Sci Exactes, LMEN, Equipe Accueil,Lab Microscopieis & Etud Nanostruc, F-51685 Reims, France
[2] Univ Cadi Ayyad, Fac Sci & Tech Gueliz, Dept Phys, Marrakech, Morocco
[3] Univ Ibn Tofail, Fac Sci, Lab Optoelect & Physicochim Mat, Kenitra, Morocco
关键词
spray pyrolysis; cathodoluminescence;
D O I
10.1016/j.jlumin.2004.09.123
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Semiconducting metal oxide such as ZnO films were prepared by the spray pyrolysis technique on glass substrates. The cathodoluminescence properties of these films were investigated with respect to deposition temperature (T-s) and air flow rate (f). The luminescent films had a polycrystalline hexagonal wurtzite-type structure. Cathodoluminescence intensity was critically dependent on substrate temperature and spray rate. The best films had three emissions: near ultra-violet (UV) band gap peak at 382 nm, a blue-green emission at 520 nm and a red emission at 672 nm. These films were deposited at optimum condition: T-s = 450 degrees C and f = 5 ml/min. (c) 2004 Elsevier B.V, All rights reserved.
引用
收藏
页码:183 / 190
页数:8
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