Structure and dynamics of amorphous silica surfaces

被引:189
作者
Roder, A
Kob, W
Binder, K
机构
[1] Univ Montpellier 2, Lab Verres, F-34095 Montpellier, France
[2] Johannes Gutenberg Univ Mainz, Inst Phys, D-55099 Mainz, Germany
关键词
D O I
10.1063/1.1360257
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We use molecular dynamics computer simulations to study the equilibrium properties of the surface of amorphous silica. Two types of geometries are investigated: (i) clusters with different diameters (13.5, 19, and 26.5 Angstrom) and (ii) a thin film with thickness 29 Angstrom. We find that the shape of the clusters is independent of temperature and that it becomes more spherical with increasing size. The surface energy is in qualitative agreement with the experimental value for the surface tension. The density distribution function shows a small peak just below the surface, the origin of which is traced back to a local chemical ordering at the surface. Close to the surface the partial radial distribution functions as well as the distributions of the bond-bond angles show features which are not observed in the interior of the systems. By calculating the distribution of the length of the Si-O rings we can show that these additional features are related to the presence of two-membered rings at the surface. The surface density of these structures is around 0.6/nm(2), in good agreement with experimental estimates. From the behavior of the mean-squared displacement at low temperatures, we conclude that at the surface the cage of the particles is larger than the one in the bulk. Close to the surface the diffusion constant is somewhat larger than the one in the bulk and with decreasing temperature the relative difference grows. The total vibrational density of states at the surface is similar to the one in the bulk. However, if only the one for the silicon atoms is considered, significant differences are found. (C) 2001 American Institute of Physics.
引用
收藏
页码:7602 / 7614
页数:13
相关论文
共 92 条
[81]   Localized low-frequency dynamics in SiO2 glass [J].
Uchino, T ;
Yoko, T .
JOURNAL OF CHEMICAL PHYSICS, 1998, 108 (19) :8130-8138
[82]   Vibrational dynamics of defect modes in vitreous silica [J].
Uchino, T ;
Tokuda, Y ;
Yoko, T .
PHYSICAL REVIEW B, 1998, 58 (09) :5322-5328
[83]   FORCE-FIELDS FOR SILICAS AND ALUMINOPHOSPHATES BASED ON ABINITIO CALCULATIONS [J].
VANBEEST, BWH ;
KRAMER, GJ ;
VANSANTEN, RA .
PHYSICAL REVIEW LETTERS, 1990, 64 (16) :1955-1958
[84]   INTERACTION POTENTIAL FOR SIO2 - A MOLECULAR-DYNAMICS STUDY OF STRUCTURAL CORRELATIONS [J].
VASHISHTA, P ;
KALIA, RK ;
RINO, JP ;
EBBSJO, I .
PHYSICAL REVIEW B, 1990, 41 (17) :12197-12209
[85]   H2 cracking at SiO2 defect centers [J].
Vitiello, M ;
Lopez, N ;
Illas, F ;
Pacchioni, G .
JOURNAL OF PHYSICAL CHEMISTRY A, 2000, 104 (20) :4674-4684
[86]   Cooling-rate effects in amorphous silica: A computer-simulation study [J].
Vollmayr, K ;
Kob, W ;
Binder, K .
PHYSICAL REVIEW B, 1996, 54 (22) :15808-15827
[87]   Investigating the cooling rate dependence of amorphous silica: A computer simulation study [J].
Vollmayr, K ;
Kob, W .
BERICHTE DER BUNSEN-GESELLSCHAFT-PHYSICAL CHEMISTRY CHEMICAL PHYSICS, 1996, 100 (09) :1399-1401
[88]   UBER SILICIUMCHALKOGENIDE .6. ZUR KENNTNIS DER FASERIGEN SILICIUMDIOXYD-MODIFIKATION [J].
WEISS, A ;
WEISS, A .
ZEITSCHRIFT FUR ANORGANISCHE UND ALLGEMEINE CHEMIE, 1954, 276 (1-2) :95-112
[89]   CONCENTRATION OF HYDROXYL-GROUPS ON THE SURFACE OF AMORPHOUS SILICAS [J].
ZHURAVLEV, LT .
LANGMUIR, 1987, 3 (03) :316-318
[90]  
2000, J PHYS CONDENS MATTE, V12, P6295