Moderator gratings for the generation of epithermal positive muons

被引:32
作者
Prokscha, T [1 ]
Morenzoni, E
David, C
Hofer, A
Glückler, H
Scandella, L
机构
[1] Paul Scherrer Inst, Lab Muon Spin Spect, CH-5232 Villigen, Switzerland
[2] Paul Scherrer Inst, Lab Micro & Nanotechnol, CH-5232 Villigen, Switzerland
[3] Univ Konstanz, Fak Phys, D-78457 Constance, Germany
关键词
muon moderation; surface patterning; low-energy muon beam;
D O I
10.1016/S0169-4332(00)00857-6
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We studied the effect of surface enlargement on the efficiency of a muon (mu (+)) moderator by comparing the flux of epithermal mu (+) emerging from a solid Ar (s-Ar) layer deposited on a Rat Al substrate with the fluxes from an Ar layer deposited on gratings manufactured in Si and Ag substrates. We developed a simple replication technique to emboss a Si g-rating into a thin Ag foil, where the gratings consist of V-shaped grooves with 20 mum depth and ridge distance of 30 mum on an area of 30 x 30 mm(2), We obtain a gain in epithermal mu (+) flux of 1.5 with respect to that of a Rat moderator geometry. The 15% reduction with respect to the geometrical enlargement factor of 1.73 is due to mu (+) absorption losses in the V-groove walls. The data imply a nearly isotropic angular distribution of epithermal mu (+) inside the s-Ar moderator and a reflection coefficient of about 80% for epithermal mu (+) impinging on s-Ar. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:235 / 244
页数:10
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