Multiple microscale plasma CVD apparatuses on a substrate

Plasma chemical vapor depositions (CVD) of carbon films using a CH4-H-2 gas system have been performed with a prototype 2 X 2 plasma chip which consists of 2 x 2 coplanar film electrodes (CFE). Using this chip, we could perform four plasma processing experiments simultaneously. A plasma chip on which plasma-processing apparatuses are integrated has advantages in plasma. processing compared to conventional ones, such as high processing speed due to the high density of the microscale plasma, and high efficiency due to parallel processing. We have obtained various carbon films easily, such as glassy carbon and diamond-like carbon, with this simple prototype plasma chip. This is the first report on plasma processing with this innovative processing device, the plasma chip. (C) 2001 Elsevier Science B.V. All rights reserved.