The effect of magnetic film structure on the inductance of a planar inductor

被引：10

作者：

Inoue, T

Nishijima, K

Yatabe, S

Mizoguchi, T

Sato, T

机构：

[1] Toshiba Corp, Semicond Div, Saiwai Ku, Kawasaki, Kanagawa 210, Japan

[2] Shinshu Univ, Dept Elect & Elect Engn, Wakasato, Nagano 380, Japan

来源：

IEEE TRANSACTIONS ON MAGNETICS | 1998年 / 34卷 / 04期

关键词：

a planar inductor; inductance; magnetic flux distribution; calculation;

D O I：

10.1109/20.706552

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Magnetic nux density distribution for a planar magnetic film inductor was calculated as a function of magnetic film thickness; permeability, in-plane slit width and undulation amplitude and insulator thickness which was inserted between magnetic films. It is important to choose a proper combination of magnetic film thickness, permeability and insulator thickness to design inductance and superimposed de current characteristic of a planar inductor in which the magnetic film structure is multi-layered. Magnetic film slit width doesn't influence on inductance. It is important to decrease undulation amplitude of a magnetic film.

引用

页码：1372 / 1374

页数：3

共 8 条

[1] ANALYSIS OF EFFICIENCY AND INDUCTANCE OF MULTI-TURN THIN-FILM MAGNETIC RECORDING-HEADS [J].