Fundamental properties in the formation of Co, Ni, and Pt metal thin films using pulsed laser deposition

Co, Ni, and Pt metal thin films have been formed using the pulsed laser deposition method. Several fundamental properties of this method, e.g., deposition rate for the KrF excimer laser with various irradiation energy densities, distribution of film thickness, change of the deposition rate as a function of the number of shots, change of the target morphology, and corresponding film structure, are examined. It is found that the deposition rate and the film structure (amorphous and/or polycrystalline) depend on the state of the morphology of the target. An attempt to control the target morphology was performed, i.e., the rotation of the Co target restrained the target surface from the formation of laser cones and as a result, the amorphous Co films could be obtained. (C) 1996 American Institute of Physics.