Remote deposition of scratch resistant films by use of slot antenna microwave plasma source

被引：12

作者：

Korzec, D

Traub, K

Werner, F

Engemann, J

机构：

[1] Microstructure Research Center - fmt, University of Wuppertal, 42287 Wuppertal

来源：

THIN SOLID FILMS | 1996年 / 281卷

关键词：

plasma processing and deposition; silicon oxide;

D O I：

10.1016/0040-6090(96)08595-1

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The slot antenna microwave plasma source is used for remote plasma deposition of scratch resistant films on polycarbonate substrates. A grid separates the primary discharge from the process chamber. The monomer hexamethyldisiloxan is distributed 5-50 mm over the substrate positioned 5-25 cm from the separation grid. With argon in the primary discharge a good sticking interface polymer layer grows. An additional amount of oxygen leads to a quartzlike layer on top. Deposition rate is typically 0.5 mu m/min. Rubber and tumble abrasion tests are used to characterise the scratch resistance.

引用

收藏

页码：143 / 145

页数：3

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