Pattern formation during delamination and buckling of thin films

被引:56
作者
Crosby, KM [1 ]
Bradley, RM
机构
[1] Carthage Coll, Dept Phys, Kenosha, WI 53140 USA
[2] Colorado State Univ, Dept Phys, Ft Collins, CO 80523 USA
来源
PHYSICAL REVIEW E | 1999年 / 59卷 / 03期
关键词
D O I
10.1103/PhysRevE.59.R2542
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
Using a-simple lattice model, we study the failure of compressively strained thin films on solid substrates. Our simulations reproduce much of the observed phenomenology of thin film blistering. In particular, we observe a peculiar form of stress relief in which a wrinkle of delaminated film propagates along a sinusoidal path. At higher intrinsic strains, the sinusoidal wrinkles bifurcate, forming branches. Finally, we identify a high-strain regime in which the film delaminates by forming a buckling front with many irregular lobes. [S1063-651X(99)50603-X].
引用
收藏
页码:R2542 / R2545
页数:4
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