Theory of a novel voltage-sustaining layer for power devices

被引:127
作者
Chen, XB
Mawby, PA
Board, K
Salama, CAT
机构
[1] Univ Wales, Dept Elect Engn, Swansea SA2 8PP, W Glam, Wales
[2] Univ Elect Sci & Technol China, Res Inst Microelect, Chengdu 610054, Sichuan, Peoples R China
[3] Univ Toronto, Dept Elect & Comp Engn, Toronto, ON M5S 3G4, Canada
关键词
breakdown voltage; power devices; specific on-resistance; voltage sustaining layers;
D O I
10.1016/S0026-2692(98)00065-2
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The theory of a novel voltage-sustaining layer for power devices, called a Composite Buffer layer (CB-layer for short) is proposed. The CB-layer can be implemented in several ways, one particular implementation is used here, which consists of alternating n- and p-type regions, that are parallel to the direction of the applied electric field. In the off-state, the fields induced by the depletion charges of both region types compensate each other to allowing the doping in both n-regions and p-regions to be very high without causing a reduction of the breakdown voltage. In the onstate the heavy doping ensures the voltage drop is very low and that the saturation current density high. A simple relationship between the specific on-resistance and R-on and the sustaining voltage V-B can be shown to be R-on = 2.53 x 10(-7) bV(B)(1.23) Omega Cm-2, where the breadth b (in mu m) of each region is much smaller than the thickness W. The design method of the CB-layer is discussed in some detail. The simulation results are shown to be in perfect agreement with the theory. The structure has application to a wide variety of different power devices, An RMOST structure has been used to demonstrate the benefits of the technique in the paper, for which excellent performance is demonstrated. (C) 1998 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:1005 / 1011
页数:7
相关论文
共 13 条
[1]  
BALIGA BJ, 1995, POWER SEMICONDUCTOR, pR11
[2]  
Chen X., 1991, U.S. Patent, Patent No. [5 216 275 A, 5216275]
[3]   OPTIMUM DOPING PROFILE OF POWER MOSFET EPITAXIAL LAYER [J].
CHEN, XB ;
HU, CM .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1982, 29 (06) :985-987
[4]  
CHEN XB, 1990, POWER MOSFET HVIC, P156
[5]  
CHEN XB, 1993, Patent No. 101845
[6]  
CHI MH, 1982, 1982 IEEE POW EL SPE, P392
[7]  
FULOP W, 1967, SOLID STATE ELECTRON, V10, P37
[8]  
HU C, 1979, IEEE T ELECTRON DEV, V26, P243
[9]  
MEESE JM, 1979, NEUTRON TRANSMUTATIO
[10]  
PARPIA Z, 1988, IEEE T ELECTRON DEV, V35, P1667