Multilayer reflectance during exposure to EUV radiation

被引：19

作者：

Oestreich, S ^{[1
]}

Klein, R ^{[1
]}

Scholze, F ^{[1
]}

Jonkers, J ^{[1
]}

Louis, E ^{[1
]}

Yakshin, A ^{[1
]}

Görts, P ^{[1
]}

Ulm, G ^{[1
]}

Haidl, M ^{[1
]}

Bijkerk, F ^{[1
]}

机构：

[1] FOM, Inst Plasma Phys Rijnhuizen, NL-3430 BE Nieuwegein, Netherlands

来源：

SOFT X-RAY AND EUV IMAGING SYSTEMS | 2000年 / 4146卷

关键词：

extreme ultraviolet lithography; EW optics; surface contamination; multilayer mirrors; hydrocarbon contamination; ozone cleaning;

D O I：

10.1117/12.406677

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Mo/Si multilayer mirrors have been exposed to intense monochromatic EUV radiation in order to investigate a possible deterioration of the mirror reflectance under different vacuum conditions. Power densities up to 3 mW/mm(2) were applied at the PTB undulator beamline at BESSY II, applying a hydrocarbon enriched vacuum. The mirror reflectance has been monitored in situ during several hours of exposure. Vacuum pressures of 3x10(-8) mbar (without hydrocarbons) and 10(-7) mba. (with hydrocarbons) at EUV intensities of 3 mW/mm(2), respectively 0.2 mW/mm(2) have been applied. The reflectance of the mirrors decreased when exposed to EUV radiation in hydrocarbon enriched vacuum, while no loss in reflectance was observed when no hydrocarbons were added to the vacuum. Ozone-cleaning experiments, using UV produced ozone from air at atmospheric pressure, were performed and show that Mo/Si mirrors do not suffer from prolonged exposure to ozone.

引用

页码：64 / 71

页数：8

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