HEAT-RESISTANCE OF MO/SI, MOSI2/SI, AND MO5SI3/SI MULTILAYER SOFT-X-RAY MIRRORS

被引：48

作者：

TAKENAKA, H ^{[1
]}

KAWAMURA, T ^{[1
]}

ISHII, Y ^{[1
]}

ASAGIRI, S ^{[1
]}

机构：

[1] KOGAKUIN UNIV, SHINJUKU KU, TOKYO 16391, JAPAN

来源：

JOURNAL OF APPLIED PHYSICS | 1995年 / 78卷 / 09期

关键词：

D O I：

10.1063/1.359698

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The effects of heating on both the reflectivity and layered structures of Mo/Si and Mo-silicide/Si (MoSi2/Si and Mo5Si3/Si) multilayers were evaluated. The Cu-K-alpha x-ray reflectivity and the periodic length of the Mo/Si multilayer markedly decreased after heating at above 300 degrees C, while those of the Mo-silicide/Si multilayers changed only slightly even after heating up to 600 degrees C. Transmission electron microscopy observations revealed markedly less thermally induced deterioration in the Mo-silicide/Si multilayers than in the Mo/Si multilayer, indicating that Mo-silicide/Si multilayers have better heat resistance than Mo/Si multilayers. (C) 1995 American Institute of Physics.

引用

页码：5227 / 5230

页数：4

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