Diffraction gratings on porous silicon

被引:12
作者
AlexeevPopov, AV [1 ]
Gevelyuk, SA [1 ]
Roizin, YO [1 ]
Savin, DP [1 ]
Kuchinsky, SA [1 ]
机构
[1] STATE OPT INST,ST PETERSBURG,RUSSIA
关键词
D O I
10.1016/0038-1098(95)00712-1
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
We have fabricated diffraction gratings by exposure of porous silicon to the focused light of UV low-power laser. Up to twenty diffraction orders could be observed with the naked eye under He-Ne laser illumination. Optical recording on porous silicon is attributed to rapid dehydrogenization of the internal surfaces of poles leading to formation of spatial structures at the external surface of porous silicon films.
引用
收藏
页码:591 / 593
页数:3
相关论文
共 5 条
[1]   SILICON QUANTUM WIRE ARRAY FABRICATION BY ELECTROCHEMICAL AND CHEMICAL DISSOLUTION OF WAFERS [J].
CANHAM, LT .
APPLIED PHYSICS LETTERS, 1990, 57 (10) :1046-1048
[2]   OPTICAL-PROPERTIES OF POROUS SILICON [J].
LOCKWOOD, DJ .
SOLID STATE COMMUNICATIONS, 1994, 92 (1-2) :101-112
[3]  
NELER C, 1995, PHYS MESSENGER, P5
[4]  
ROIZIN YO, 1992, P LAMP 92 NAGAOKA, P657
[5]   OPTICAL WRITING MECHANISM OF TEXTURED MEDIA [J].
SUH, SY ;
CRAIGHEAD, HG .
APPLIED OPTICS, 1985, 24 (02) :208-214