Dynamic behavior of carbon ultrathin film formation

被引：16

作者：

Durand, HA ^{[1
]}

Sekine, K ^{[1
]}

Etoh, K ^{[1
]}

Ito, K ^{[1
]}

Kataoka, I ^{[1
]}

机构：

[1] Japan Aviat Elect Ind Ltd, Cent Res Lab, Akishima, Tokyo 196, Japan

来源：

JOURNAL OF APPLIED PHYSICS | 1998年 / 84卷 / 05期

关键词：

D O I：

10.1063/1.368420

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We present here investigations of the initial steps in the formation of ultrathin carbon films on a carbon highly oriented pyrolytic graphite substrate by the deposition of low energy carbon ions at temperatures from ambient to 300 degrees C. We used an ultrahigh vacuum scanning tunneling microscopy to observe the growth of these films. At a nanometer scale, we revealed a roughening transition of the island's growth, from lateral to tridimensional growth. Also, here we introduce the scaling analysis of roughness to describe the evolution of the morphology of the interface during growth. The ultrathin film formation mechanisms are studied as a function of ion density and annealing. (C) 1998 American Institute of Physics. [S0021-8979(98)01416-9].

引用

页码：2591 / 2596

页数：6

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