Electronic structure of amorphous silicon nanoclusters

被引:197
作者
Allan, G
Delerue, C
Lannoo, M
机构
[1] Institut d’Electronique et de Microélectronique du Nord, Département ISEN, Villeneuve d’ Ascq, 59652
关键词
D O I
10.1103/PhysRevLett.78.3161
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
The electronic structure of amorphous silicon nanoclusters is calculated within the empirical tight-binding approximation. The electronic states are classified into three groups: extended and weakly and strongly localized. The last category practically disappears in hydrogenated amorphous silicon clusters for which the blueshift is comparable to what is predicted for crystallites. The radiative recombination rates are comparable for small clusters (similar to 1 nm) but 2 orders of magnitude higher for larger clusters (similar to 2 nm) of the amorphous phase due to disorder induced breaking of selection rules.
引用
收藏
页码:3161 / 3164
页数:4
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