Ge nanostructures: average and local structure

被引:7
作者
Kolobov, AV [1 ]
机构
[1] AIST, Ctr Appl Near Field Opt Res, Tsukuba, Ibaraki 3058562, Japan
关键词
D O I
10.1023/B:JMSE.0000012455.87480.9b
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A review of an important class of electronic materials, namely, Ge nanostructures, is given. This paper first discusses the geometrical aspects of the nanostructures, both epitaxially grown quantum dots and embedded nanocrystals. This is followed by a description of the structure. Structural techniques relying on long-range ordering, such as diffraction, are compared to methods depending on local bonding, namely Raman scattering and X-ray absorption fine structure. Merits and pitfalls of various techniques are also discussed. The review is concluded by a discussion of possible advanced applications of Ge nanostructures. (C) 2004 Kluwer Academic Publishers.
引用
收藏
页码:195 / 203
页数:9
相关论文
共 120 条
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Kolobov, AV ;
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APPLIED PHYSICS LETTERS, 2001, 78 (22) :3550-3551
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APPLIED PHYSICS LETTERS, 2001, 78 (04) :451-453