Additive nanoscale embedding of functional nanoparticles on silicon surface

被引：27

作者：

Cavallini, Massimiliano ^{[1
]}

Simeone, Felice C. ^{[1
]}

Borgatti, Francesco ^{[1
]}

Albonetti, Cristiano ^{[1
]}

Morandi, Vittorio ^{[2
]}

Sangregorio, Claudio ^{[3
,4
,5
]}

Innocenti, Claudia ^{[4
,5
]}

Pineider, Francesco ^{[4
,5
]}

Annese, Emilia ^{[6
]}

Panaccione, Giancarlo ^{[6
]}

Pasquali, Luca ^{[7
]}

机构：

[1] CNR ISMN, I-40129 Bologna, Italy

[2] CNR IMM Bologna, I-4012 Bologna, Italy

[3] CNR ISTM Milano, I-20133 Milan, Italy

[4] Univ Florence, INSTM, I-50019 Sesto Fiorentino, FI, Italy

[5] Univ Florence, Dep Chem U Schiff, I-50019 Sesto Fiorentino, FI, Italy

[6] CNR INFM TASC SS, I-34149 Basovizza, TS, Italy

[7] Univ Modena & Reggio Emilia, Dep Mat & Environm Engn, I-41100 Modena, Italy

来源：

NANOSCALE | 2010年 / 2卷 / 10期

关键词：

SINGLE-MOLECULE MAGNETS; SOFT-LITHOGRAPHY; LOCAL OXIDATION; QUANTUM DOTS; THIN-FILMS; POLYMERS; NANOLITHOGRAPHY; NANOFABRICATION; NANOCRYSTALS; MORPHOLOGY;

D O I：

10.1039/c0nr00315h

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

We present a novel additive process, which allows the spatially controlled integration of nanoparticles (NPs) inside silicon surfaces. The NPs are placed between a conductive stamp and a silicon surface; by applying a bias voltage a SiO2 layer grows underneath the stamp protrusions, thus embedding the particles. We report the successful nanoembedding of CoFe2O4 nanoparticles patterned in lines, grids and logic structures.

引用

收藏

页码：2069 / 2072

页数：4

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