Study of the influence of adsorbed water on AFM friction measurements on molybdenum trioxide thin films

被引：26

作者：

Gulbinski, W

Pailharey, D ^{[1
]}

Suszko, T

Mathey, Y

机构：

[1] Tech Univ Koszalin, Fac Mech Engn, Dept Phys, PL-75620 Koszalin, Poland

[2] Univ Mediterranee, CNRS, UMR 6631, Grp Phys Etats Condenses, F-13288 Marseille 9, France

来源：

SURFACE SCIENCE | 2001年 / 475卷 / 1-3期

关键词：

atomic force microscopy; adhesion; friction; molybdenum oxides;

D O I：

10.1016/S0039-6028(00)01101-8

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Thin films of layered oxide alpha -MoO3 have been prepared by reactive magnetron sputtering. On these films we have measured friction forces and adhesive forces at the microscopic scale with an AFM, under ambient and humidity controlled conditions. We show that surface crystallinity and orientation induce local values of the microscopic friction coefficient. The correlation between water adsorption, adhesion and friction is discussed. (C) 2001 Elsevier Science B.V. All rights reserved.

引用

页码：149 / 158

页数：10

共 15 条

[1] EFFECTS OF HIGH-FLUX LOW-ENERGY (20-100 EV) ION IRRADIATION DURING DEPOSITION ON THE MICROSTRUCTURE AND PREFERRED ORIENTATION OF TI0.5AL0.5N ALLOYS GROWN BY ULTRA-HIGH-VACUUM REACTIVE MAGNETRON SPUTTERING [J].