Carbon spheres generated in 'dusty plasmas'

被引:29
作者
Chen, GY [1 ]
Stolojan, V
Silva, SRP
Herman, H
Haq, S
机构
[1] Univ Surrey, Dept Elect Engn, Adv Technol Inst, Surrey GU2 7XH, England
[2] BAE SYST, Ctr Adv Technol, Bristol BS34 7QW, Avon, England
关键词
plasma deposition; Raman spectroscopy;
D O I
10.1016/j.carbon.2004.10.037
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The formation of spherical hydrogenated amorphous carbon (a-C:H) particulates generated in a radio frequency plasma enhanced chemical vapour deposition (rf-PECVD) system is reported. These particulates appear as a white powder-no other contaminants appear to be present. electron energy loss spectroscopy (EELS) shows characteristics typical of a-C:H with a reduced plasmon energy due to hydrogen incorporation. Raman spectroscopy however revealed a 1456cm(-1) line which was previously not reported on a-C:H films deposited using similar processes. infrared (IR) spectroscopy shows that these spheres are mainly partially oxidised, methyl-rich, aliphatic hydrocarbons. (C) 2004 Elsevier Ltd. All rights reserved.
引用
收藏
页码:704 / 708
页数:5
相关论文
共 13 条
[1]  
BROSKY MH, 1997, PHYS REV B, V16, P3556
[2]   Fullerene and nanotube formation in cool terrestrial "dusty plasmas" [J].
Burden, AP ;
Silva, SRP .
APPLIED PHYSICS LETTERS, 1998, 73 (21) :3082-3084
[3]   PRODUCTION OF CARBON SPHERULES AND THEIR GRAPHITIZATION [J].
INAGAKI, M ;
WASHIYAMA, M ;
SAKAI, M .
CARBON, 1988, 26 (02) :169-172
[4]   Particle accumulation in a flowing silane discharge [J].
Jelenkovic, BM ;
Gallagher, A .
JOURNAL OF APPLIED PHYSICS, 1997, 82 (04) :1546-1553
[5]  
Koidl P., 1990, Mater. Sci. Forum, V52, P41, DOI [10.4028/www.scientific.net/MSF.52-53.41, DOI 10.4028/WWW.SCIENTIFIC.NET/MSF.52-53.41]
[6]   The Fe(CO)5 catalyzed pyrolysis of pentane:: carbon nanotube and carbon nanoball formation [J].
Liu, XY ;
Huang, BC ;
Coville, NJ .
CARBON, 2002, 40 (15) :2791-2799
[7]   A comparative analysis of a-C:H by infrared spectroscopy and mass selected thermal effusion [J].
Ristein, J ;
Stief, RT ;
Ley, L ;
Beyer, W .
JOURNAL OF APPLIED PHYSICS, 1998, 84 (07) :3836-3847
[8]  
SEOL KS, 2001, RIKEN REV, V38, P12
[9]   A chemical vapour deposition process for the production of carbon nanospheres [J].
Serp, P ;
Feurer, R ;
Kalck, P ;
Kihn, Y ;
Faria, JL ;
Figueiredo, JL .
CARBON, 2001, 39 (04) :621-626
[10]   INSITU OBSERVATION OF PARTICLE BEHAVIOR IN RF SILANE PLASMAS [J].
SHIRATANI, M ;
MATSUO, S ;
WATANABE, Y .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1991, 30 (08) :1887-1892