Nanostructured copper filaments in electrochemical deposition

被引:93
作者
Wang, M [1 ]
Zhong, S
Yin, XB
Zhu, JM
Peng, RW
Wang, Y
Zhang, KQ
Ming, NB
机构
[1] Nanjing Univ, Natl Lab Solid State Microstruct, Nanjing 210093, Peoples R China
[2] Nanjing Univ, Dept Phys, Nanjing 210093, Peoples R China
关键词
D O I
10.1103/PhysRevLett.86.3827
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
In this Letter we report a novel self-organized copper electrodeposition in an ultrathin layer of CuSO4 electrolyte. The macroscopic fingering branches of the deposit consist of long copper filaments covered with periodic corrugated nanostructures. The mechanism of the nanostructure formation is explored and the origin of the significant descent of the branching rate in electrodeposition is discussed. We suggest that this growth phenomenon provides deeper insights into the role of diffusion and migration on pattern formation in electrodepositisn.
引用
收藏
页码:3827 / 3830
页数:4
相关论文
共 25 条
  • [11] Runaway growth in two-dimensional electrodeposition
    Fleury, V
    Barkey, D
    [J]. EUROPHYSICS LETTERS, 1996, 36 (04): : 253 - 258
  • [12] ROLE OF CONVECTION IN THIN-LAYER ELECTRODEPOSITION
    HUTH, JM
    SWINNEY, HL
    MCCORMICK, WD
    KUHN, A
    ARGOUL, F
    [J]. PHYSICAL REVIEW E, 1995, 51 (04): : 3444 - 3458
  • [13] Further insights on dynamic morphological transitions in quasi-two-dimensional electrodeposition
    Lopez-Salvans, MQ
    Sagues, F
    Claret, J
    Bassas, J
    [J]. PHYSICAL REVIEW E, 1997, 56 (06): : 6869 - 6876
  • [14] Fingerlike aggregates in thin-layer electrodeposition
    LopezSalvans, MQ
    Trigueros, PP
    Vallmitjana, S
    Claret, J
    Sagues, F
    [J]. PHYSICAL REVIEW LETTERS, 1996, 76 (21) : 4062 - 4065
  • [15] INTERFACIAL VELOCITY IN ELECTROCHEMICAL DEPOSITION AND THE HECKER TRANSITION
    MELROSE, JR
    HIBBERT, DB
    BALL, RC
    [J]. PHYSICAL REVIEW LETTERS, 1990, 65 (24) : 3009 - 3012
  • [16] ROSENBERGER F, 1979, FUNDAMENTALS CRYSTAL, V1
  • [17] Electrochemical self-assembly of copper/cuprous oxide layered nanostructures
    Switzer, JA
    Hung, CJ
    Huang, LY
    Switzer, ER
    Kammler, DR
    Golden, TD
    Bohannan, EW
    [J]. JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1998, 120 (14) : 3530 - 3531
  • [18] In situ probing of interfacial processes in the electrodeposition of copper by confocal Raman microspectroscopy
    Texier, F
    Servant, L
    Bruneel, JL
    Argoul, F
    [J]. JOURNAL OF ELECTROANALYTICAL CHEMISTRY, 1998, 446 (1-2): : 189 - 203
  • [19] A high performance 1.8V, 0.20μm CMOS technology with copper metallization
    Venkatesan, S
    Gelatos, AV
    Misra, V
    Smith, B
    Islam, R
    Cope, J
    Wilson, B
    Tuttle, D
    Cardwell, R
    Anderson, S
    Angyal, M
    Bajaj, R
    Capasso, C
    Crabtree, P
    Das, S
    Farkas, J
    Filipiak, S
    Fiordalice, B
    Freeman, M
    Gilbert, PV
    Herrick, M
    Jain, A
    Kawasaki, H
    King, C
    Klein, J
    Lii, T
    Reid, K
    Saaranen, T
    Simpson, C
    Sparks, T
    Tsui, P
    Venkatraman, R
    Watts, D
    Weitzman, EJ
    Woodruff, R
    Yang, I
    Bhat, N
    Hamilton, G
    Yu, Y
    [J]. INTERNATIONAL ELECTRON DEVICES MEETING - 1997, TECHNICAL DIGEST, 1997, : 769 - 772
  • [20] Vicsek T, 1992, FRACTAL GROWTH PHENO