Highly corrected submicrometer grid patterning on curved surfaces

被引：8

作者：

Baker, KM ^{[1
]}

机构：

[1] Optimerix Co, Van Nuys, CA 91401 USA

来源：

APPLIED OPTICS | 1999年 / 38卷 / 02期

关键词：

D O I：

10.1364/AO.38.000339

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

A compact holographic projector system was built and tested. This projection system offers a practical approach for making a highly corrected mesh or grid pattern on curved surfaces. The pattern can range in size from multimicrometer to submicrometer dimensions and be recorded in either positive or negative photoresist. Standing-wave interference patterns in the form of a diverging close-packed lattice of either hexagonal or square rodlike intensity maxima extending outward from a point or a locus of points are produced by multiple-beam holography that involves the combination of a holographic diffraction grating and a hypercomatic focusing objective. (C) 1999 Optical Society of America.

引用

页码：339 / 351

页数：13

共 42 条

[11] Interferometric lithography of sub-micrometer sparse hole arrays for field-emission display applications [J].