Illumination optics design for EUV-lithography

被引：17

作者：

Antoni, M ^{[1
]}

Singer, W ^{[1
]}

Schultz, J ^{[1
]}

Wangler, J ^{[1
]}

Escudero-Sanz, I ^{[1
]}

Kruizinga, B ^{[1
]}

机构：

[1] Carl Zeiss AG, D-73446 Oberkochen, Germany

来源：

SOFT X-RAY AND EUV IMAGING SYSTEMS | 2000年 / 4146卷

关键词：

EUV lithography; illumination optics; etendue; fly's-eye condenser; conical reflection;

D O I：

10.1117/12.406673

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

The demanding performance of optical systems for EUV lithography requires new and innovative solutions for the illumination optics design. The illuminator is one of the key components for EUV-lithography. It has to provide uniform illumination across the are-shaped field and to comply with the telecentricity requirements of the projection lens. The illuminator has to be adapted to size and divergence of an EUV source. The constraint of minimizing the number of optical elements is compensated for by enhancing the complexity of single optical elements, which in turn challenges fabrication. In this paper, a comparison of two different solutions for the illuminator is presented. The systems are intended to comply with the illumination requirements, but have different advantages and drawbacks. The examples represent solutions based on conical reflection and on a fly's-eye integrator. A comparison is given and the potentials of the different solutions are outlined.

引用

页码：25 / 34

页数：10

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