Optimized oxygen plasma etching of polycarbonate for low-loss optical waveguide fabrication

被引：32

作者：

Kang, JW ^{[1
]}

Kim, JS ^{[1
]}

Kim, JJ ^{[1
]}

机构：

[1] Kwangju Inst Sci & Technol, Dept Mat Sci & Engn, Kwangju 500712, South Korea

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 2001年 / 40卷 / 5A期

关键词：

reactive ion etching; polymer; optical waveguide; thermal stability; low-loss; polycarbonate;

D O I：

10.1143/JJAP.40.3215

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The oxygen plasma etching condition of polycarbonate was characterized in detail to fabricate low-loss optical waveguides. The effects of etching parameters such as rf power and chamber pressure were systematically studied and the parameters were optimized to minimize the surface roughness in etched areas. Buried channel waveguides with thermally stable polycarbonate were fabricated using the optimized conditions, resulting in smooth and almost vertical etched patterns. The waveguides showed an optical loss of less than 0.8 dB/cm and 1.4 dB/cm at the wavelength of 1.3 mum for TE and TM polarizations, respectively. The refractive index of polycarbonate after being stored at 190-230 degreesC for 1 h remains almost constant, demonstrating the thermal stability of polycarbonate waveguides.

引用

页码：3215 / 3219

页数：5