Continuous and modulated deposition of fluorocarbon films from c-C4F8 plasmas

被引：72

作者：

Milella, A

Palumbo, F

Favia, P

Cicala, G

d'Agostino, R

机构：

[1] Univ Bari, Dipartimento Chim, I-70126 Bari, Italy

[2] CNR, IMIP, Ist Metodol Inorgan & Plasmi, I-70126 Bari, Italy

来源：

PLASMA PROCESSES AND POLYMERS | 2004年 / 1卷 / 02期

关键词：

continuous discharges; fluorinated coatings; modulated discharges; morphology; nanostructures;

D O I：

10.1002/ppap.200400021

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Continuous and modulated C-C4F8 (perfluorocyclobutane) plasmas were used to deposit thin Teflon-like films. Gas phase and film composition and structure were investigated and the results can be rationalized with the deposition mechanism developed in a previous work for C2F4-modulated plasmas. The effect of modulation on the morphology and the chemistry of the surface were studied.

引用

页码：164 / 170

页数：7

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