High-spatial resolution resistivity mapping of large-area YBCO films by a near-field millimeter-wave microscope

被引:38
作者
Golosovsky, M
Galkin, A
Davidov, D
机构
[1] Racah Institute of Physics, Hebrew University of Jerusalem
关键词
D O I
10.1109/22.508246
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We demonstrate a new millimeter-wave technique for the resistivity mapping of large-area conducting films, namely, a near-field resistivity microscope. The microscope is based on the idea that electromagnetic waves are transmitted through a narrow resonant slit with high efficiency. By scanning this slit at fixed height above an inhomogeneous conducting surface and measuring the intensity and phase of the reflected wave, the resistivity of this surface may be determined with a 10-100 mu m spatial resolution using 80-GHz radiation. Using this technique, we map normal-sate resistivity of 1 in x 1 in YBCO films at ambient temperature. In some films we find inhomogeneities of the normal-state sheet resistance of the order of 10%-20%.
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页码:1390 / 1392
页数:3
相关论文
共 14 条
[11]  
SPADA EJ, 1993, SEMICOND SCI TECH, V8, P937
[12]   NONDESTRUCTIVE CHARACTERIZATION OF MATERIALS BY EVANESCENT MICROWAVES [J].
TABIBAZAR, M ;
SHOEMAKER, NS ;
HARRIS, S .
MEASUREMENT SCIENCE AND TECHNOLOGY, 1993, 4 (05) :583-590
[13]  
VELEY VF, 1987, MODERN MICROWAVE TEC, P157
[14]  
WIESENDANGER R, 1994, SCANNING PROBE