Adaptive control approach of rapid thermal processing

被引:19
作者
Choi, JY [1 ]
Do, HM
Choi, HS
机构
[1] Seoul Natl Univ, ASRI, Sch Elect Engn & Comp Sci, Seoul 151742, South Korea
[2] Seoul Natl Univ, ASRI, Nexreal Inc, Seoul 151742, South Korea
关键词
adaptive feedback linearization; PLAN; RTP; sliding mode control;
D O I
10.1109/TSM.2003.818961
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
This paper presents an adaptive control approach for achieving the control of the wafer temperature in a rapid thermal processing system (RTP). Numerous, studies have addressed the temperature control problem in RTP and most researches,on this problem require exact knowledge of the systems dynamics. However, it is difficult to acquire this exact knowledge. Thus, various approaches cannot guarantee the desired performance in practical application When there exist some modeling errors between the model and the actual system. In this paper, an adaptive control scheme is applied to RTP without exact information. on the dynamics: The system dynamics are-assumed to be an affine. nonlinear form, and the unknown portion of the dynamics are estimated by a neural network referred to a piecewise linear approximation network (PLAN). The controller architecture is based on an adaptive feedback linearization scheme and augmented. by sliding mode control. The performance of the proposed method. is demonstrated by experimental results on an RTP system of Kornic Systems Corporation, Korea.
引用
收藏
页码:621 / 632
页数:12
相关论文
共 14 条
[11]   THERMAL UNIFORMITY AND STRESS MINIMIZATION DURING RAPID THERMAL-PROCESSES [J].
PERKINS, RH ;
RILEY, TJ ;
GYURCSIK, RS .
IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 1995, 8 (03) :272-279
[12]  
SCHAPER C, 1991, SPIE RAPID THERMAL I
[13]  
[No title captured]
[14]  
[No title captured]