Characterization of sputtered NiO thin films

被引:261
作者
Chen, HL [1 ]
Lu, YM
Hwang, WS
机构
[1] Natl Cheng Kung Univ, Dept Mat Sci & Engn, Tainan 70101, Taiwan
[2] Kun Shan Univ Technol, Dept Elect Engn, Tainan 71003, Taiwan
[3] Kun Shan Univ Technol, Nano Technol Res & Dev Ctr, Tainan 71003, Taiwan
关键词
nickel oxide; sputtering; thin film; Hall effect; natural aging;
D O I
10.1016/j.surfcoat.2004.10.032
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Nickel oxide (NiO) thin films were deposited by RF magnetron sputtering process at different RF powers and substrate temperatures in a pure oxygen atmosphere. The structural, optical and electrical properties of NiO films were investigated using X-ray diffraction (XRD), visible spectrum and Hall effect measurements. The dependences of film properties on substrate temperature, crystalline structure and natural aging effect were studied. The results show that the resistivity increases as sputtering power increases from 100 to 200 W at constant temperature. The lowest resistivity and Hall coefficient obtained are 16.7 Omega cm and 1.99 cm(3)/C, respectively, as the sputtering power is 100 W and substrate temperature is 350 degrees. The highest carrier concentration obtained is 3.13 X 10(18) cm(-3) as the sputtering power is 100 Wand substrate temperature is 350 degrees. The crystal structure was analyzed by X-ray diffraction method. The preferred orientation of NiO film changes from (111) to (200) when the substrate temperature varies from unheated condition to 350 degrees. Electrical properties of NiO films were unstable and show a natural aging effect. Resistivity of NiO films increases as the time of natural aging increases. Under the substrate-unheated condition, the transmittance of as-deposited samples is lower compared to the film prepared at substrate temperature of 350 degrees C. The change in transmittance may be due to the microstructural change in the material. It is suggested that the sputtering power affects the preferred orientation of NiO film. Higher substrate temperature induces larger grain size and more perfect crystalline structure, which lead to low resistivity of NiO film. (c) 2004 Published by Elsevier B.V.
引用
收藏
页码:138 / 142
页数:5
相关论文
共 13 条
[1]   Thin (NiO)1-x(Al2O3)x, Al doped and Al coated NiO layers for gas detection with HSGFET [J].
Bogner, M ;
Fuchs, A ;
Scharnagl, K ;
Winter, R ;
Doll, T ;
Eisele, I .
SENSORS AND ACTUATORS B-CHEMICAL, 1998, 47 (1-3) :145-152
[2]   Preferred orientations of NiO films prepared by plasma-enhanced metalorganic chemical vapor deposition [J].
Fujii, E ;
Tomozawa, A ;
Torii, H ;
Takayama, R .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1996, 35 (3A) :L328-L330
[3]   The influence of process parameters and annealing temperature on the physical properties of sputtered NiO thin films [J].
Hotovy, I ;
Huran, J ;
Spiess, L ;
Liday, J ;
Sitter, H ;
Hascík, S .
VACUUM, 2002, 69 (1-3) :237-242
[4]   Ni-defective value and resistivity of sputtered NiO films [J].
Kohmoto, O ;
Nakagawa, H ;
Ono, F ;
Chayahara, A .
JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, 2001, 226 (PART II) :1627-1628
[5]   Preparation and characteristics of nickel oxide thin film by controlled growth with sequential surface chemical reactions [J].
Kumagai, H ;
Matsumoto, M ;
Toyoda, K ;
Obara, M .
JOURNAL OF MATERIALS SCIENCE LETTERS, 1996, 15 (12) :1081-1083
[6]   Properties of nickel oxide thin films deposited by RF reactive magnetron sputtering [J].
Lu, YM ;
Hwang, WS ;
Yang, JS ;
Chuang, HC .
THIN SOLID FILMS, 2002, 420 :54-61
[7]   Effects of substrate temperature on the resistivity of non-stoichiometric sputtered NiOx films [J].
Lu, YM ;
Hwang, WS ;
Yang, JS .
SURFACE & COATINGS TECHNOLOGY, 2002, 155 (2-3) :231-235
[8]   Carrier transport, structure and orientation in polycrystalline silicon on glass [J].
Nakahata, K ;
Miida, A ;
Kamiya, T ;
Fortmann, CM ;
Shimizu, I .
THIN SOLID FILMS, 1999, 337 (1-2) :45-50
[9]   Transparent conducting lithium-doped nickel oxide thin films by spray pyrolysis technique [J].
Puspharajah, P ;
Radhakrishna, S ;
Arof, AK .
JOURNAL OF MATERIALS SCIENCE, 1997, 32 (11) :3001-3006
[10]   TRANSPARENT CONDUCTING P-TYPE NIO THIN-FILMS PREPARED BY MAGNETRON SPUTTERING [J].
SATO, H ;
MINAMI, T ;
TAKATA, S ;
YAMADA, T .
THIN SOLID FILMS, 1993, 236 (1-2) :27-31