Preparation and characteristics of nickel oxide thin film by controlled growth with sequential surface chemical reactions

被引:141
作者
Kumagai, H [1 ]
Matsumoto, M [1 ]
Toyoda, K [1 ]
Obara, M [1 ]
机构
[1] KEIO UNIV,FAC SCI & TECHNOL,KOHOKU KU,YOKOHAMA,KANAGAWA 223,JAPAN
关键词
D O I
10.1007/BF00274914
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
[No abstract available]
引用
收藏
页码:1081 / 1083
页数:3
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