COMPARATIVE-STUDY OF AL2O3 OPTICAL CRYSTALLINE THIN-FILMS GROWN BY VAPOR COMBINATIONS OF AL(CH3)3/N2O AND AL(CH3)3/H2O2

被引：45

作者：

KUMAGAI, H ^{[1
]}

TOYODA, K ^{[1
]}

MATSUMOTO, M ^{[1
]}

OBARA, M ^{[1
]}

机构：

[1] KEIO UNIV,FAC SCI & TECHNOL,KOHOKU KU,YOKOHAMA,KANAGAWA 223,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1993年 / 32卷 / 12B期

关键词：

CHEMICAL VAPOR DEPOSITION; SURFACE CHEMICAL REACTION; AL2O3; VARIABLE-ANGLE SPECTROSCOPIC ELLIPSOMETRY; TRIMETHYLALUMINUM; NITROUS OXIDE; HYDROGEN PEROXIDE;

D O I：

10.1143/JJAP.32.6137

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We compared the use of nitrous oxide (N2O) and hydrogen peroxide (H2O2) as the.oxidant in digital chemical vapor deposition to obtain high-quality optical crystalline thin films of Al2O3. Optical constants and thicknesses of these films were investigated in terms of growth temperature, by using variable-angle spectroscopic ellipsometry.

引用

页码：6137 / 6140

页数：4

共 6 条

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