Influence of substrate temperature and sputtering atmosphere on electrical and optical properties of double silver layer systems

被引：76

作者：

Klöppel, A ^{[1
]}

Meyer, B ^{[1
]}

Trube, J ^{[1
]}

机构：

[1] Appl Films, D-63755 Alzenau, Germany

来源：

THIN SOLID FILMS | 2001年 / 392卷 / 02期

关键词：

coatings; deposition process; resistance; optical properties;

D O I：

10.1016/S0040-6090(01)01049-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A new method for the preparation of double silver layer systems with ultra-low resistance and high visible transmittance for use as low-emissivity (low -E) coatings, low resistance transparent electrodes for display applications and also electromagnetic interference (EMI) shieldings in plasma display panel (PDP) applications has been successfully developed. in this paper, the results of an optimization of the deposition conditions of both oxide layers and metallic layers using indium-tin oxide (ITO) and indium-cerium oxide (ICO) as transparent oxides and a silver alloy as a metallic layer are illustrated. (C) 2001 Elsevier Science B.V. All rights reserved.

引用

页码：311 / 314

页数：4

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