Application of heavy-ion RBS to compositional analysis of thin films

被引：10

作者：

Niwa, H ^{[1
]}

Nakao, S ^{[1
]}

Saitoh, K ^{[1
]}

机构：

[1] Natl Ind Res Inst Nagoya, Nagoya, Aichi 462, Japan

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1998年 / 136卷

关键词：

heavy-ion beam; C; O; RBS analysis; compositional analysis; thin film; Ni-Cr; Co; Cu; Si; island growth;

D O I：

10.1016/S0168-583X(97)00696-4

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

A 8 MeV multicharged carbon or oxygen beam was used for Rutherford Backscattering Spectrometry (RBS) compositional analysis. Thin films of Co, Cu, Si, and Ni-Cr of a few nm thickness were deposited on carbon substrates by vacuum evaporation or Ar sputtering. The measured results demonstrate that the mass resolution is much better for the heavy-ion RES than for the He-RES analysis. For the compositional analysis, a fitting function formula is proposed based on a simple model in which the thin film consists of many islands. The calculated results agree with the measured spectra, which show asymmetry of the peaks. Numerical analyses using the fitting function give reasonable agreement between the expected and measured ratios of mass elements in the films. (C) 1998 Published by Elsevier Science B.V.

引用

页码：297 / 300

页数：4

共 6 条

[1]

Chu W., 1978, BACKSCATTERING SPECT, DOI DOI 10.1016/B978-0-12-173850-1.50008-9

[2] 3-DIMENSIONAL MICROANALYSIS USING A FOCUSED MEV OXYGEN ION-BEAM [J].