Electron paramagnetic resonance of deep boron in silicon carbide

被引:18
作者
Baranov, PG
Mokhov, EN
机构
[1] Ioffe Physico-Technical Institute, St Petersburg 194021
关键词
D O I
10.1088/0268-1242/11/4/005
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this article we report the first EPR observation of deep boron centres in silicon carbide. A direct identification of the boron atom involved in the defect centre, considered as deep boron, has been established by the presence of a hyperfine interaction with B-11 and B-10 nuclei in isotope-enriched GH-SiC:B crystals. Deep boron centres were shown from EPR spectra to have axial symmetry along the hexagonal axis. A correspondence between the EPR spectra and the luminescence, ODMR and DLTS spectra of deep boron centres has been indicated. The structural model for a deep boron centre as a boron-vacancy pair is presented and the evidence for bistable behaviour of deep boron centres is discussed.
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页码:489 / 494
页数:6
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