Electro-thermal modeling of multifinger AlGaN/GaN HEMT device operation including thermal substrate effects

被引:93
作者
Heller, E. R. [1 ,2 ]
Crespo, A. [3 ]
机构
[1] USAF, Res Lab, Mat Directorate, Wright Patterson AFB, OH 45433 USA
[2] Wright State Univ, Semicond Res Ctr, Dayton, OH 45435 USA
[3] USAF, Res Lab, Sensors Directorate, Wright Patterson AFB, OH 45433 USA
关键词
D O I
10.1016/j.microrel.2007.01.090
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
AlGaN/GaN high electron mobility transistor (HEMT) device operation was modeled from the sub-micrometer scale to the substrate using a combination of an electro-thermal device model for the active device with realistic power dissipation within the device and a coupled three dimensional thermal model to account for the substrate. Temperatures for various points within a device were determined as a function of biasing conditions, substrate thickness and temperature, number of fingers, and gate length and pitch. As an example, we have used our model to show that life test results of industry-relevant devices can be significantly affected by the exact testing technique used. (c) 2007 Published by Elsevier Ltd.
引用
收藏
页码:45 / 50
页数:6
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